Optical polishing methods include heat flow method, etch back method, rotating glass method, electron surround resonance method, low pressure CVD, selective deposition, deposition-etch-deposition, plasma-enhanced CVD, etc. These technologies have been used in the development of material planarization technology. Since these technologies belong to the local planarization of materials, in order to achieve global planarization, the use of polishing powder as a chemical mechanical polishing technology has gradually begun to develop.
In recent years, with the rapid development of cutting-edge technologies such as aerospace technology, optoelectronic technology, atomic energy technology, and laser technology, the requirements for the relevant performance of optical components have become higher and higher. In the above-mentioned high-precision science and technology fields, optical components are widely used, but the surface quality of optical components is relatively high. Therefore, ultra-precision processing of optical components is a challenge. In the processing technology of optical components, polishing is a very critical step in the processing of optical components. Optical polishing can eliminate surface scratches and surface damage of optical components and improve the surface quality of optical components.
